Development of Molybdenum trioxide (MoO3) by spin coating method for photovoltaic application

Authors

  • L.Chibane Laboratory of Advanced Technologies of Genie Electrics (LATAGE) Author
  • MS.Belkaid Laboratory of Advanced Technologies of Genie Electrics (LATAGE) Author
  • M. Pasquinelli Aix-Marseille University, Institut Matériaux Microélectronique Nanosciences de Provence Author
  • H.Derbal-Habak Aix-Marseille University, Institut Matériaux Microélectronique Nanosciences de Provence Author
  • J-J. Simon Aix-Marseille University, Institut Matériaux Microélectronique Nanosciences de Provence Author
  • D.Hocine Aix-Marseille University, Institut Matériaux Microélectronique Nanosciences de Provence Author
  • O.Boudia Aix-Marseille University, Institut Matériaux Microélectronique Nanosciences de Provence Author

DOI:

https://doi.org/10.24084/repqj10.840

Keywords:

Material, MoO3, oxide, lamellar, photovoltaic

Abstract

Molybdenum trioxide, MoO3 , thin films have been deposited on glass substrates by Spin-coating method using ammonium heptamolybdate tetrahydrate ((NH4 )6Mo7O244H2O ) as a single source precursor of Mo and O and. They were subjected to atmospheric heat treatment at different temperatures (200°C, 400°C and 500°C). MoO3 thin films obtained, were characterized using X-ray diffraction techniques (XRD), Scanning Electron Microscopy (SEM), Energy Dispersed Spectroscopy (EDS) and integrating sphere. The XRD patterns of annealed films show the formation of ΜοΟ3 in a polycrystalline phase, formation of MoO3 was also confirmed by EDS. The SEM photographs show that the thin films obtained are in layer-type structure and their grains size increases with increasing of annealing temperatures. The measurement results of integrating sphere show that the MoO3 thin film prepared at 500°C transmit about 72% and reflect about 12% of the visible spectrum.

Published

2024-01-19

Issue

Section

Articles