Development of Molybdenum trioxide (MoO3) by spin coating method for photovoltaic application
DOI:
https://doi.org/10.24084/repqj10.840Keywords:
Material, MoO3, oxide, lamellar, photovoltaicAbstract
Molybdenum trioxide, MoO3 , thin films have been deposited on glass substrates by Spin-coating method using ammonium heptamolybdate tetrahydrate ((NH4 )6Mo7O244H2O ) as a single source precursor of Mo and O and. They were subjected to atmospheric heat treatment at different temperatures (200°C, 400°C and 500°C). MoO3 thin films obtained, were characterized using X-ray diffraction techniques (XRD), Scanning Electron Microscopy (SEM), Energy Dispersed Spectroscopy (EDS) and integrating sphere. The XRD patterns of annealed films show the formation of ΜοΟ3 in a polycrystalline phase, formation of MoO3 was also confirmed by EDS. The SEM photographs show that the thin films obtained are in layer-type structure and their grains size increases with increasing of annealing temperatures. The measurement results of integrating sphere show that the MoO3 thin film prepared at 500°C transmit about 72% and reflect about 12% of the visible spectrum.